Product features
High Precision: ±0.5μm @3σ; Angle ±0.01° @3σ;
High Speed: Placement cycle <10s;
Supports 6pcs 6" or 3pcs 8" wafer rings (wafer, waffle pack, gel-pak);
Supports a wide range of chip sizes, multi-chip placement capability, large placement area;
Bonding head heating function: 450℃ ±2.5℃; Substrate heating function: 350℃ ±3.5℃;
Supports ultra-low bond force, wide controllable bond force range;
Support for Die face up/face down bonding;
Repeatable sub-micron placement accuracy;
Supports multiple bonding methods (adhesive bonding, TC bonding, ultrasonic bonding);
Compatible with nitrogen, formic acid, nitrogen-hydrogen mixed atmosphere, strong process scalability for fluxless applications;
Excellent airtightness and extremely low gas consumption;
Ultra-high-definition PLXvision™ alignment system; Auto IQC system, SECS/GEM(MES) supported.
